Synthesizing native 2K multi-garment virtual try-on is a formidable frontier in digital fashion, critically bottlenecked by two fundamental limitations: the O(N^2) memory explosion induced by 2k conditions, and the spectral bias of diffusion models that over-smooths high-frequency fabric details. We present WearWow, an end-to-end, mask-free generative framework that pioneers ultra-high-resolution multi-garment synthesis. To mitigate the memory explosion , we propose Adaptive 2D Token Packing (ATP). ATP leverages inherent garment sparsity to algorithmically pack heterogeneous items onto a unified 2D canvas and prune uninformative background tokens, minimizing the effective sequence length and subsequent memory overhead while rigorously preserving 2D spatial priors. To rectify texture degradation, we introduce the Multi-dimensional Try-on Reward (MTR) system. MTR synergizes a Semantic Guidance Reward to explicitly drive tactile restoration with a Cloth Distribution Reward to implicitly anchor the physical distribution, a joint formulation that effectively mitigates the severe reward hacking. Furthermore, we curate WearWow-2K, an extreme-quality dataset comprising native 2K triplets, providing physically correct spatial interactions that naturally empower the model's mask-free generation. Extensive experiments demonstrate that WearWow establishes a new state-of-the-art, exceeding existing commercial baselines in native 2K multi-garment synthesis.
Image outpainting extends an image beyond its original borders, requiring seamless style integration and globally coherent scene completion. Building on the success of diffusion models, recent methods have achieved substantial improvements in visual quality. In practice, however, high-resolution outpainting is commonly performed via progressive expansion around a fixed source image, particularly in artwork scenarios. Despite this progress, existing approaches still suffer from three key limitations: (i) the absence of a reliable global planning mechanism, which leads to structural instability and error accumulation at high resolutions; (ii) limited spatial controllability beyond text prompts, making it difficult to place objects at user-specified locations; and (iii) high inference latency caused by inherently sequential patch generation. To address these issues, we propose a global blueprint-guided two-stage diffusion framework for layout-controllable high-resolution outpainting with efficient parallel synthesis. In Stage 1, we generate a low-resolution global blueprint using a layout adapter that injects bounding-box conditions into a Stable Diffusion inpainting backbone, producing a globally consistent structural plan while extracting global guidance features. In Stage 2, we synthesize high-resolution local patches in parallel by injecting the blueprint-derived global guidance and initializing each patch from the blueprint using the low-frequency preservation property of forward diffusion. This design eliminates sequential dependency while maintaining global coherence. Extensive experiments on large-scale artwork datasets demonstrate improved visual fidelity, stronger semantic consistency, and substantially reduced inference time compared to prior baselines, while uniquely supporting explicit layout control for artwork outpainting.